How ROC Achieved PV ≤ 1.0 μm on a 12-Inch, 10 mm-Thick Specialty Glass Wafer
ROC and its material partner co-developed a 12-inch, 10 mm specialty glass wafer for lithography equipment. ROC’s precision grinding and polishing process achieved surface figure (PV) ≤ 1.0 μm, parallelism ≤ 1.8 μm, surface roughness Ra ≤ 0.18 nm and concentricity tolerance ±0.030 mm.
